Southeast University, Nanjing 211189, China
LabRAM Odyssey Nano
TERS imaging is performed with an AFM-Raman system, where a Scanning Probe microscope (SPM that can be used in atomic force, scanning tunneling, or normal/shear force mode) is integrated with a confocal Raman spectrometer through an opto-mechanical coupling. The scanning probe microscope allows for nanoscale imaging, the optical coupling brings the excitation laser to the functionalized tip (or probe), and the spectrometer analyzes the Raman (or otherwise scattered) light providing a hyperspectral image with nanometer scale chemical contrast.
A TERS system is based on a metallic tip (generally made of gold or silver) employed to concentrate the incident light field at the apex. The tip acts as a nano-source of light and local field enhancer, greatly improving the Raman sensitivity (by a factor of 103 -107) and reducing the probed volume to the “nano” region immediately below the tip.
MULTI-SAMPLE ANALYSIS PLATFORM
Macro, micro and nano scale measurements can be performed on the same platform.HIGH COLLECTION EFFICIENCY
Top-down, oblique and bottom Raman detection for optimum resolution and throughput in both co-localized and tip-enhanced measurements.HIGH SPECTRAL RESOLUTION
Ultimate spectral resolution performance, multiple gratings with automated switching, wide spectral range analysis for Raman and Photoluminescence.
HIGH SPATIAL RESOLUTION
Nanoscale spectroscopic resolution (down to 10 nm) through Tip-Enhanced Optical Spectroscopies (TERS: Tip-Enhanced Raman Spectroscopy and TEPL: Tip-Enhanced Photoluminescence).
MULTI-TECHNIQUE / MULTI-ENVIRONMENT
Numerous SPM modes including AFM, conductive and electrical modes (cAFM, KPFM), STM, liquid cell and electrochemical environment, together with chemical mapping through TERS/TEPL. Full control of the two instruments through one workstation and a powerful software control, SPM and spectrometer can be operated simultaneously or independently.
HORIBA Jobin Yvon LabRAM HR Raman system
The LabRAM HR systems provide high spectroscopic resolution and a unique wavelength range capability that offers both great flexibility and high performance. They are widely used for standard Raman analysis, photoluminescence (PL), tip enhanced Raman scattering (TERS) and other hybrid methods.
High spectral resolutionThe unique high resolution mode is ideal for subtle band analysis such as that for phase (crystalline/amorphous), of proteins, weak bonding forces (such as hydrogen bonding) and semiconductor stress measurements – in fact most applications where it is important for the precise characterization of position or shape of the Raman spectral features. Band analysis with a resolution in the order of 0.3 cm-1 to 1 cm-1 is particularly suited to the high resolution mode. Its dual capabilities also enable more routine low/medium resolution Raman analysis and even broader band laser induced micro-fluorescence or luminescence to be conducted on the same bench-top instrument.
True confocal performance
The LabRAM HR has a true confocal pinhole with user controlled variable aperture. Unlike pseudo-confocal configurations (e.g., slit-binning methods) the confocal pinhole fully matches the laser spot and provides the highest spatial resolution with maximum signal throughput.
UV, visible and NIR capability
The LabRAM HR can be configured with the unique Dual Path Optics to allow UV-visible-NIR sensitivity without compromise. Unlike achromat (lens) based systems the Dual Path Optics offers fast, simple switching between UV and VIS/NIR regions. No adjustment or alignment is required.
Integrated upright, inverted and free space microscopes
Different applications can be best served with different microscopes – for this reason, the LabRAM HR can be configured with standard upright, inverted or free space microscopes.
Fast Raman imaging
With the SWIFT™ and DuoScan™ fast Raman imaging technologies the LabRAM HR allows the collection of large area Raman images in the matter of seconds/minutes. The unique combination of innovative optics, detectors and software combine to provide true confocal Raman imaging with an unmatched speed of data acquisition.
XploRA™ Desktop Confocal Raman Microscope
Xplora plus is an intelligent fully automatic micro Raman system, which integrates many unique functions. It not only has excellent performance, but also is convenient to use and fast to analyze. It is very suitable for multi-user operation and switching analysis of various samples. It is an ideal choice for research work and Analysis Center. Xplora plus is equipped with a unique swift fast imaging function, which can realize ultra fast confocal Raman imaging, which is 10 times faster than ordinary imaging speed. The true confocal design ensures high-quality imaging quality and spatial resolution even under ultra fast imaging conditions. In addition, Xplora plus has unparalleled scalability, such as polarization Raman, particle analysis and Raman AFM.
Xplora plus is a high-performance and compact Raman spectrometer with microscopic confocal function based on the simple and easy-to-use design concept and user's operation habits, and integrated with a variety of intelligent functions.
HORIBA Jobin Yvon Fluorolog-3 Spectrofluorometer
The FluoroLog®-3 is a unique, modular system which allows the researcher to interchange a versatile range of accessories to correspond perfectly with the characteristics of a given sample. From analysis of steady-state or molecular dynamics to IR probes, the FluoroLog®-3 comes equipped with a wide range and limitless configuration of accessories to enhance the accuracy and speed of your application.
HITACHI U-3900 UV-Visible Spectrophotometer
Item | U-3900 | U-3900H |
Monochromator | Diffraction grating Single monochromator Seya-Namioka mount |
Diffraction grating-diffraction grating Double monochromator Seya-Namioka mount |
Wavelength range | 190 to 900 nm | |
Spectral bandpass | 0.1, 0.5, 1, 2, 4, 5 nm (6 steps) | |
Wavelength accuracy | ±0.1 nm (at 656.1 nm after wavelength calibration) |
OptiFDTD
OptiFDTD 10.0is a powerful, highly integrated, and user friendly CAD environment that enables the design and simulation of advanced passive and non-linear photonic components.
OptiFDTD enables you to design, analyze and test modern passive and nonlinear photonic components for wave propagation, scattering, reflection, diffraction, polarization and nonlinear phenomena. The core program of OptiFDTD is based on the Finite-Difference Time-Domain (FDTD) algorithm with second-order numerical accuracy and the most advanced boundary conditions – Uniaxial Perfectly Matched Layer (UPML).
The algorithm solves both electric and magnetic fields in temporal and spatial domain using the full-vector differential form of Maxwell’s coupled curl equations. This allows for arbitrary model geometries and places no restriction on the material properties of the devices.
MSP-300CT Magnetron Sputtering System
This equipment can be used for the preparation of single film, multilayer film, co-sputtering film, noble metal film, semiconductor film, dielectric film, magnetic film, heat-resistant alloy film, hard film, etc.
Item | Parameter | |
Power supply | DC power supply x2 set and RF power supply x1 set |
|
Control method | PC automatic control | |
Sputtering path | Upward | |
Process gas | 2 routes gas flow | |
Ultimate vacuum | ≤ 1.0 x10-5 Pa | |
Sputtering target | φ50 mm x3 set | |
Substrate temperature | Room temperature~600 ℃ | |
Uniformity of film thickness | With the scope of φ50 mm≤ ±5.0 % |
MNT Single Chamber Type ALD
The MNT-S ALD system equipped with ozone generator and visual operation interface. Could be used to deposit conventional oxide films, copper, TiN , etc. There are water source, aluminum source, molybdenum source and silicon source ,respectively.
MNT-S ALD | sample chamber size: | 12 inches |
Substrate heating temperature: | RT-400℃;1℃ | |
Number of precursor paths: | 4 ways | |
Pipeline temperature of precursor source: |
RT-200℃;1℃ | |
Source vessel temperature: | RT-200℃;1℃ | |
Depositional model: | Fast mode, high depth ratio mode, professional doping mode |
High Vacuum Electron Beam Evaporator TEMD500
Colleges, universities, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.
Item | Parameter | |
Vacuum chamber structure | Vertical cylindrical side opening structure, rear exhaust system |
|
Vacuum chamber size | Φ500 × H650 mm | |
Heating temperature | Room temperature~300 ℃ | |
Rotating substrate stage | Flat type Φ200 mm | |
Uniformity of film thickness | ≤ ±5.0 % | |
Kaufman ion source | Optional | |
Evaporation source | Electron gun 8 KW, 6-cavity crucible, domestic and imported optional, with 3-3 groups of resistance evaporation | |
Control method | PLC + touch screen man-machine interface semi-automatic control system | |
Area | Length × Width L2500 × W1600 mm | |
Total power | ≥ 17 KW |