HORIBA Jobin Yvon LabRAM HR Raman system

  • Overview

    The LabRAM HR systems provide high spectroscopic resolution and a unique wavelength range capability that offers both great flexibility and high performance. They are widely used for standard Raman analysis, photoluminescence (PL), tip enhanced Raman scattering (TERS) and other hybrid methods.

  • Features

    High spectral resolutionThe unique high resolution mode is ideal for subtle band analysis such as that for phase (crystalline/amorphous), of proteins, weak bonding forces (such as hydrogen bonding) and semiconductor stress measurements – in fact most applications where it is important for the precise characterization of position or shape of the Raman spectral features. Band analysis with a resolution in the order of 0.3 cm-1 to 1 cm-1 is particularly suited to the high resolution mode. Its dual capabilities also enable more routine low/medium resolution Raman analysis and even broader band laser induced micro-fluorescence or luminescence to be conducted on the same bench-top instrument.

    True confocal performance
    The LabRAM HR has a true confocal pinhole with user controlled variable aperture. Unlike pseudo-confocal configurations (e.g., slit-binning methods) the confocal pinhole fully matches the laser spot and provides the highest spatial resolution with maximum signal throughput.

    UV, visible and NIR capability
    The LabRAM HR can be configured with the unique Dual Path Optics to allow UV-visible-NIR sensitivity without compromise. Unlike achromat (lens) based systems the Dual Path Optics offers fast, simple switching between UV and VIS/NIR regions. No adjustment or alignment is required.

    Integrated upright, inverted and free space microscopes
    Different applications can be best served with different microscopes – for this reason, the LabRAM HR can be configured with standard upright, inverted or free space microscopes.

    • The upright microscope is the standard option for materials analysis, and widely used for Raman analysis in many varied fields.
    • The inverted microscope is ideally suited for life science research, where tissue and live cells are frequently analysed within culture media.
    • The free space microscope provides a unique level of access to samples. The bottom frame is removable so that it offers a large free space beneath the microscope objective turret. Large cryostats, (e.g., liquid Helium cooled), sample environment equipment (diamond anvil cells) and similar devices can be accommodated with this microscope.
    • Dual microscope options are also available (for example, upright + inverted) – these allow the benefits of different configurations to be available on a single Raman instrument.

    Fast Raman imaging
    With the SWIFT™ and DuoScan™ fast Raman imaging technologies the LabRAM HR allows the collection of large area Raman images in the matter of seconds/minutes. The unique combination of innovative optics, detectors and software combine to provide true confocal Raman imaging with an unmatched speed of data acquisition.

HORIBA Jobin Yvon Fluorolog-3 Spectrofluorometer

  • Overview

    The FluoroLog®-3 is a unique, modular system which allows the researcher to interchange a versatile range of accessories to correspond perfectly with the characteristics of a given sample. From analysis of steady-state or molecular dynamics to IR probes, the FluoroLog®-3 comes equipped with a wide range and limitless configuration of accessories to enhance the accuracy and speed of your application.

  • Features

    • World’s most sensitive spectrofluorometer *
    • Can detect 50-femtomolar fluorescein
    • Unique, modular system adapts to new experiments or changing techonolgy so is never obsolete
    • Interchange wide range of computer-controlled accessories: spectrometers, detectors, sources, and more!
    • Totally computer-controlled
    • All-reflective optics so that the sample is in focus at all wavelengths

MTI Mini CVD Tube Furnace

  • GSL-1700X-F3LV series tube furnace is a CE certified alumina tube furnace with mechanical vacuum pump and two channels gas flowing system, which can heat sample to 1700°C and achieve vacuum degree up to 5×10-2 torr and mix 2 type of gases for CVD or diffusion

  • Specifications:

  • Tube Furnace Structure Double layer steel casing with air cooling. Two cooling fan inside to keep temperature of outside case < 55°C.
    High purity fibrous alumina insulation for Max, energy saving.
    Heating Element 1800 grade MoSi2 ( 8 pcs )
    Max. Heating Temp. 1700°C
    Max. Heating Rate 5°C/min
    Max. Cooling Rate 5°C/min
    Heating Zone Length 455mm (18″)
    Constant Temp. Zone 150(+/-1C)
    Temp. Controller One precision temperature controllers.
    PID precision control by SCR
    30 segments programmable for any temperature profile.
    Built in protection for overheated and broken thermal couple.
    Temp. Accuracy +/-1°C
    Tube Size and Materials 99.8% high purity Al2O3 ceramic tube
    ID: 72mm x OD: 80 mm x 1000 mm length.

HITACHI U-3900 UV-Visible Spectrophotometer

  • Possible to perform measurements in a wide absorbance range with low stray light and low noise.
    The larger the amount of transmitted light, the lower the noise of the obtained absorption spectrum so that a wider absorbance range can be measured. Measurements of high concentration samples can be performed over a wider concentration range.
  • Stable spectrometer with double beam optical system
    The light source uses a WI lamp (visible range) and a D2 lamp (ultraviolet range) that switches wavelength depending on the measurement. The double beam system divides the monochromatic light so that the diffraction grates into the control and the sample with a rotational mirror, guiding the light to the sample chamber.
    Single Monochrome Type U-3900 uses a spherical surface mirror in front of the entrance slit, while the Double Monochrome Type U-3900H uses diffraction grating.
  • UV Solutions for U-3900 (PC connected) allows for easy device control and supports various quantitative-analysis functions.
    Special operation software that offers substantial functions such as measurement data comparison and a preview function that allows for a more powerful analysis.

    Item U-3900 U-3900H
    Monochromator Diffraction grating
    Single monochromator
    Seya-Namioka mount
    Diffraction grating-diffraction
    grating Double monochromator
    Seya-Namioka mount
    Wavelength range 190 to 900 nm
    Spectral bandpass 0.1, 0.5, 1, 2, 4, 5 nm (6 steps)
    Wavelength accuracy ±0.1 nm (at 656.1 nm after wavelength calibration)


  • OptiFDTD 10.0is a powerful, highly integrated, and user friendly CAD environment that enables the design and simulation of advanced passive and non-linear photonic components.

  • OptiFDTD enables you to design, analyze and test modern passive and nonlinear photonic components for wave propagation, scattering, reflection, diffraction, polarization and nonlinear phenomena. The core program of OptiFDTD is based on the Finite-Difference Time-Domain (FDTD) algorithm with second-order numerical accuracy and the most advanced boundary conditions – Uniaxial Perfectly Matched Layer (UPML).

  • The algorithm solves both electric and magnetic fields in temporal and spatial domain using the full-vector differential form of Maxwell’s coupled curl equations. This allows for arbitrary model geometries and places no restriction on the material properties of the devices.

Dell Precision T5500 Workstation x2

Incredibly powerful and scalable despite its compact size, the dual-socket Dell™ Precision™ T5500 delivers the full processor and memory performance of the new Intel® Xeon® architecture.
Core features include:

  • Powerful dual-socket performance in a system that’s compact enough for smaller workspaces and limited desk space
  • Serious performance in complex application environments, thanks to next-generation Intel Xeon architecture
  • Massive memory scalability (up to 72GB2of DDR3 Registered ECC memory)

    Big Performance, Small Footprint

    Built for environments where space is at a premium, the Dell Precision T5500 delivers dual-socket workstation performance in a compact, quiet package.

    Incredibly fast and efficient despite its size, the Dell Precision T5500 features dual-socket Intel Xeon architecture with Intel QuickPath technology (in which each processor core features an integrated memory controller and high-speed interconnects), as well as support for up to 72GB2 of DDR3 Registered ECC memory.

    For even more stunning levels of performance, the optional NVIDIA® Tesla™ C2075 GPU card can be added, creating your own “personal supercomputer” for CUDA-enabled applications.

MSP-300CT Magnetron Sputtering System

  • This equipment can be used for the preparation of single film, multilayer film, co-sputtering film, noble metal film, semiconductor film, dielectric film, magnetic film, heat-resistant alloy film, hard film, etc.

  • Specifications:

  • Item Parameter
    Power supply DC power supply x2 set and RF power supply x1 set
    Control method PC automatic control
    Sputtering path Upward
    Process gas 2 routes gas flow
    Ultimate vacuum ≤ 1.0 x10-5 Pa
    Sputtering target φ50 mm x3 set
    Substrate temperature Room temperature~600 ℃
    Uniformity of film thickness With the scope of φ50 mm≤ ±5.0 %

MNT Single Chamber Type ALD

  • The MNT-S ALD system equipped with ozone generator and visual operation interface. Could be used to deposit conventional oxide films, copper, TiN , etc. There are water source, aluminum source, molybdenum source and silicon source ,respectively.

  • Specifications:

  • MNT-S ALD Sample chamber size: 12 inches
    Substrate heating temperature: RT-400℃;1℃
    Number of precursor paths: 4 ways
    Pipeline temperature of
    precursor source:
    Source vessel temperature: RT-200℃;1℃
    Depositional model: Fast mode, high depth ratio mode, professional doping mode

High Vacuum Electron Beam Evaporator TEMD500

  • Application

    Colleges, universities, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.

  • Features

    • Integrated equipment design, small footprint, high cost performance, stable performance, low maintenance cost.
    • It is suitable for the preparation of metal element films, semiconductor films, and organic films in the laboratory, and can also be used for the preliminary process test of the production line.
    • Suitable for the preparation of optical films, conductive films, semiconductor films, ferroelectric films, etc.


  • Item Parameter
    Vacuum chamber structure Vertical cylindrical side opening structure, rear exhaust system
    Vacuum chamber size Φ500 × H650 mm
    Heating temperature Room temperature~300 ℃
    Rotating substrate stage Flat type Φ200 mm
    Uniformity of film thickness ≤ ±5.0 %
    Kaufman ion source Optional
    Evaporation source Electron gun 8 KW, 6-cavity crucible, domestic and imported optional, with 3-3 groups of resistance evaporation
    Control method PLC + touch screen man-machine interface semi-automatic control system
    Area Length × Width L2500 × W1600 mm
    Total power ≥ 17 KW
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