Southeast University, Nanjing 211189, China
HORIBA Jobin Yvon LabRAM HR Raman system
The LabRAM HR systems provide high spectroscopic resolution and a unique wavelength range capability that offers both great flexibility and high performance. They are widely used for standard Raman analysis, photoluminescence (PL), tip enhanced Raman scattering (TERS) and other hybrid methods.
High spectral resolutionThe unique high resolution mode is ideal for subtle band analysis such as that for phase (crystalline/amorphous), of proteins, weak bonding forces (such as hydrogen bonding) and semiconductor stress measurements – in fact most applications where it is important for the precise characterization of position or shape of the Raman spectral features. Band analysis with a resolution in the order of 0.3 cm-1 to 1 cm-1 is particularly suited to the high resolution mode. Its dual capabilities also enable more routine low/medium resolution Raman analysis and even broader band laser induced micro-fluorescence or luminescence to be conducted on the same bench-top instrument.
True confocal performance
The LabRAM HR has a true confocal pinhole with user controlled variable aperture. Unlike pseudo-confocal configurations (e.g., slit-binning methods) the confocal pinhole fully matches the laser spot and provides the highest spatial resolution with maximum signal throughput.
UV, visible and NIR capability
The LabRAM HR can be configured with the unique Dual Path Optics to allow UV-visible-NIR sensitivity without compromise. Unlike achromat (lens) based systems the Dual Path Optics offers fast, simple switching between UV and VIS/NIR regions. No adjustment or alignment is required.
Integrated upright, inverted and free space microscopes
Different applications can be best served with different microscopes – for this reason, the LabRAM HR can be configured with standard upright, inverted or free space microscopes.
Fast Raman imaging
With the SWIFT™ and DuoScan™ fast Raman imaging technologies the LabRAM HR allows the collection of large area Raman images in the matter of seconds/minutes. The unique combination of innovative optics, detectors and software combine to provide true confocal Raman imaging with an unmatched speed of data acquisition.
HORIBA Jobin Yvon Fluorolog-3 Spectrofluorometer
The FluoroLog®-3 is a unique, modular system which allows the researcher to interchange a versatile range of accessories to correspond perfectly with the characteristics of a given sample. From analysis of steady-state or molecular dynamics to IR probes, the FluoroLog®-3 comes equipped with a wide range and limitless configuration of accessories to enhance the accuracy and speed of your application.
MTI Mini CVD Tube Furnace
GSL-1700X-F3LV series tube furnace is a CE certified alumina tube furnace with mechanical vacuum pump and two channels gas flowing system, which can heat sample to 1700°C and achieve vacuum degree up to 5×10-2 torr and mix 2 type of gases for CVD or diffusion
|Tube Furnace||Structure||Double layer steel casing with air cooling. Two cooling fan inside to keep temperature of outside case < 55°C.
High purity fibrous alumina insulation for Max, energy saving.
|Heating Element||1800 grade MoSi2 ( 8 pcs )|
|Max. Heating Temp.||1700°C|
|Max. Heating Rate||5°C/min|
|Max. Cooling Rate||5°C/min|
|Heating Zone Length||455mm (18″)|
|Constant Temp. Zone||150(+/-1C)|
|Temp. Controller||One precision temperature controllers.
PID precision control by SCR
30 segments programmable for any temperature profile.
Built in protection for overheated and broken thermal couple.
|Tube Size and Materials||99.8% high purity Al2O3 ceramic tube
ID: 72mm x OD: 80 mm x 1000 mm length.
HITACHI U-3900 UV-Visible Spectrophotometer
grating Double monochromator
|Wavelength range||190 to 900 nm|
|Spectral bandpass||0.1, 0.5, 1, 2, 4, 5 nm (6 steps)|
|Wavelength accuracy||±0.1 nm (at 656.1 nm after wavelength calibration)|
OptiFDTD 10.0is a powerful, highly integrated, and user friendly CAD environment that enables the design and simulation of advanced passive and non-linear photonic components.
OptiFDTD enables you to design, analyze and test modern passive and nonlinear photonic components for wave propagation, scattering, reflection, diffraction, polarization and nonlinear phenomena. The core program of OptiFDTD is based on the Finite-Difference Time-Domain (FDTD) algorithm with second-order numerical accuracy and the most advanced boundary conditions – Uniaxial Perfectly Matched Layer (UPML).
The algorithm solves both electric and magnetic fields in temporal and spatial domain using the full-vector differential form of Maxwell’s coupled curl equations. This allows for arbitrary model geometries and places no restriction on the material properties of the devices.
Dell Precision T5500 Workstation x2
Incredibly powerful and scalable despite its compact size, the dual-socket Dell™ Precision™ T5500 delivers the full processor and memory performance of the new Intel® Xeon® architecture.
Core features include:
Big Performance, Small Footprint
Built for environments where space is at a premium, the Dell Precision T5500 delivers dual-socket workstation performance in a compact, quiet package.
Incredibly fast and efficient despite its size, the Dell Precision T5500 features dual-socket Intel Xeon architecture with Intel QuickPath technology (in which each processor core features an integrated memory controller and high-speed interconnects), as well as support for up to 72GB2 of DDR3 Registered ECC memory.
For even more stunning levels of performance, the optional NVIDIA® Tesla™ C2075 GPU card can be added, creating your own “personal supercomputer” for CUDA-enabled applications.
MSP-300CT Magnetron Sputtering System
This equipment can be used for the preparation of single film, multilayer film, co-sputtering film, noble metal film, semiconductor film, dielectric film, magnetic film, heat-resistant alloy film, hard film, etc.
|Power supply||DC power supply x2 set and RF power supply x1 set
|Control method||PC automatic control|
|Process gas||2 routes gas flow|
|Ultimate vacuum||≤ 1.0 x10-5 Pa|
|Sputtering target||φ50 mm x3 set|
|Substrate temperature||Room temperature~600 ℃|
|Uniformity of film thickness||With the scope of φ50 mm≤ ±5.0 %|
MNT Single Chamber Type ALD
The MNT-S ALD system equipped with ozone generator and visual operation interface. Could be used to deposit conventional oxide films, copper, TiN , etc. There are water source, aluminum source, molybdenum source and silicon source ,respectively.
|MNT-S ALD||Sample chamber size：||12 inches|
|Substrate heating temperature：||RT-400℃；1℃|
|Number of precursor paths：||4 ways|
|Pipeline temperature of
|Source vessel temperature：||RT-200℃；1℃|
|Depositional model：||Fast mode, high depth ratio mode, professional doping mode|
High Vacuum Electron Beam Evaporator TEMD500
Colleges, universities, research institutes and enterprises for scientific research and small batch preparation of new thin film materials.
|Vacuum chamber structure||Vertical cylindrical side opening structure, rear exhaust system
|Vacuum chamber size||Φ500 × H650 mm|
|Heating temperature||Room temperature～300 ℃|
|Rotating substrate stage||Flat type Φ200 mm|
|Uniformity of film thickness||≤ ±5.0 %|
|Kaufman ion source||Optional|
|Evaporation source||Electron gun 8 KW, 6-cavity crucible, domestic and imported optional, with 3-3 groups of resistance evaporation|
|Control method||PLC + touch screen man-machine interface semi-automatic control system|
|Area||Length × Width L2500 × W1600 mm|
|Total power||≥ 17 KW|